Global Database

        
Categories/Technical Area:      
      Coating deposition technologies/ Materials/ Surface engineering
        
City/Country:      
      Italy / MILANO
        
Institution/Company:      
      CNR/ IFP
        
Facility Name:      
      R2008
        
Link with which DataBase:      
     
        
Contact Person:      
      E. VASSALLO espedito.vassallo@cnr.ifp.it
        
Facility Short Description:      
      The apparatus aims to deposit functional coatings by means of the Physical Vapour Deposition method (enhcanced with the direct sputtering approach). The method allows the production of coatings that can be considered to prevent wear, galling, fretting, corrosion, oxidation of internal components of next generation fission and fusion reactors.
        
Main Technical Characteristics:      
      Power 600 W
Working gas Ar/O2/H2
Working pressure 0,1-10 Pa
Deposition rate 1-30 nm/min
Coatings thickness 0,1-5 mm
Sample holder temp. 300-700 K
Target 3-in diameter
        
Offered Services:      
      Coatings deposition
        
Willingness to Receive Trainees:      
      YES
        
How Can Facilities Be Accessed by Third Parties:      
      person